The Nanoscribe GT is a 3D laser lithography system that excels in creating structures in the micro and nano meter ranges. It uses UV-curable photoresists, and through a two-photon polymerization process it generates these structures. It has roughly a 200 nm resolution in all three axis. It is possible to create structures exceeding 1mm height, however, the resolution does decrease when exceeding 300um. These numbers do vary depending the objective purchased. The video below is an example of the exposure process.
I'm the lead operator of the Nanoscribe GT system installed in the University of Maryland Research Prototyping Lab. I have close to 500 hours on the machine by now. I run jobs for my own research as well as requests from other University researchers. It has been an extraordinary opportunity to take my design and prototyping abilities to the micro scale.